◉ Mini-BENCH Ultra High Temperature Small Tabletop Experimental Furnace Max 2200℃

◉ Mini-BENCH Ultra High Temperature Small Tabletop Experimental Furnace Max 2200℃
Tabletop-sized carbon experimental furnace - space-saving, maximum operating temperature 2200°C (short-term) 2000°C (continuous). We also manufacture metal furnaces for reducing atmospheres. ◉ Tabletop size, space-saving: 328 x 220 x 250mm ◉ For sample sintering in crucibles (crucible Φ50 x 100), or flat heaters for sintering Φ1" and Φ2" wafers ◉ High specifications & high cost performance ◉ Easy maintenance: parts replacement is simple ◉ Simple structure, excellent maintainability
31~38 item / All 38 items
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Vacuum Deposition Device "MiniLab-080"
Flexible configuration available upon request for methods such as deposition, sputtering, and EB. Adopts a tall chamber with a height of 570mm, contributing to improved uniformity during deposition.
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Sputtering device 'nanoPVD-S10A'
High-performance, cost-effective RF/DC magnetron sputtering device for research and development.
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Vacuum deposition device 'MiniLab-090' (for glove box)
Storage-compatible glove box PVD flexible thin film experimental device, featuring a tall chamber with a height of 570mm, contributes to improved uniformity during deposition.
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Vacuum Deposition Device "MiniLab Series"
Due to its modular embedded design, it is possible to flexibly assemble dedicated machines according to the required film formation methods. A compact thin-film experimental device that can accommodate various research applications.
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Vacuum Deposition Device "nanoPVD-T15A"
We have incorporated all the latest vacuum deposition technology into a compact benchtop-sized device that can effectively utilize limited lab space.
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Sputtering device 'MiniLab-026'
Compact and space-saving! Ideal for research and development. Flexible configuration for purposes such as deposition, sputtering, and annealing.
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Vacuum Deposition Device "MiniLab-026"
Compact and space-saving! Ideal for research and development, flexible configuration for purposes such as deposition, sputtering, and annealing.
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Annealing furnace "Mini-BENCH-prism ultra-high temperature experimental furnace"
Maximum operating temperature 2000℃ Semi-automatic control Ultra-high temperature experimental furnace (carbon furnace, tungsten metal furnace) Compact and space-saving experimental furnace
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