◆◇◆ R&D用小型縦型実験炉 TVF-110 ◆◇◆
◆◇◆ R&D用小型縦型実験炉 TVF-110 ◆◇◆
ローコスト 必要最小構成（手動制御）管状炉・拡散炉・熱CVD用加熱リアクター部として応用可能 小片試料〜3inch waferまでの小基板用 サセプタ手動昇降式縦型実験炉 大学・企業研究室での基礎実験用に最適な基礎実験用ローコスト版縦型炉 主な仕様】 ・炉内温度Max1200℃, 試料最大温度Max950℃ ・小片試料：数ミリサイズ〜3inchウエハーサイズまで対応 ・基板枚数：1〜3枚程度 ・石英サセプタ手動昇降式：停止位置目盛、クランパ付き ・炉芯管：Φ100 x Φ95 x 470L mm ・昇降：手動回転ハンドル ・温度調節：PIDプログラム温度調節計 ・熱電対：2対式K熱電対x1（制御用、過昇温用）、Kタイプ素線（炉芯測温用）
31～39 件を表示 ／ 全 39 件
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Sputtering device "MiniLab-060"
A semi-custom-made thin film experimental device that can be assembled with the desired configuration for processes such as sputtering, EB (electron beam), and annealing.
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Vacuum Deposition Device "MiniLab-080"
Flexible configuration available upon request for methods such as deposition, sputtering, and EB. Adopts a tall chamber with a height of 570mm, contributing to improved uniformity during deposition.
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Sputtering device 'nanoPVD-S10A'
High-performance, cost-effective RF/DC magnetron sputtering device for research and development.
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Vacuum deposition device 'MiniLab-090' (for glove box)
Storage-compatible glove box PVD flexible thin film experimental device, featuring a tall chamber with a height of 570mm, contributes to improved uniformity during deposition.
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Vacuum Deposition Device "MiniLab Series"
Due to its modular embedded design, it is possible to flexibly assemble dedicated machines according to the required film formation methods. A compact thin-film experimental device that can accommodate various research applications.
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Vacuum Deposition Device "nanoPVD-T15A"
We have incorporated all the latest vacuum deposition technology into a compact benchtop-sized device that can effectively utilize limited lab space.
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Sputtering device 'MiniLab-026'
Compact and space-saving! Ideal for research and development. Flexible configuration for purposes such as deposition, sputtering, and annealing.
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Vacuum Deposition Device "MiniLab-026"
Compact and space-saving! Ideal for research and development, flexible configuration for purposes such as deposition, sputtering, and annealing.
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Annealing furnace "Mini-BENCH-prism ultra-high temperature experimental furnace"
Maximum operating temperature 2000℃ Semi-automatic control Ultra-high temperature experimental furnace (carbon furnace, tungsten metal furnace) Compact and space-saving experimental furnace
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