◉ 【MiniLab-080】Flexible Thin Film Experimental Device
◉ 【MiniLab-080】Flexible Thin Film Experimental Device
The ML-080, consisting of a D-type box chamber with a volume of 80 liters and dimensions of 400(W)x400(D)x570(H)mm, has a longer TS distance adjustment range by increasing the height of the chamber compared to the 060 model, which improves film uniformity during deposition on large-diameter substrates. It is a higher model than the ML-060, which can also add a load lock mechanism. Like the 060, it is compact yet supports a wide range of applications including resistance heating deposition (metal/insulator/organic materials), EB deposition, RF/DC compatible magnetron sputtering, dry etching, CVD, and annealing. - Resistance heating deposition source x up to 4 - Organic deposition source x up to 4 - Magnetron sputtering cathodes x 4 - Electron beam deposition - Maximum Φ8 inch heating stage (standard 500℃, Max 1000℃) - RF/DC etching system - CVD (thermal CVD, PECVD)
31～39 item / All 39 items
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Sputtering device "MiniLab-060"
A semi-custom-made thin film experimental device that can be assembled with the desired configuration for processes such as sputtering, EB (electron beam), and annealing.
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Vacuum Deposition Device "MiniLab-080"
Flexible configuration available upon request for methods such as deposition, sputtering, and EB. Adopts a tall chamber with a height of 570mm, contributing to improved uniformity during deposition.
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Sputtering device 'nanoPVD-S10A'
High-performance, cost-effective RF/DC magnetron sputtering device for research and development.
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Vacuum deposition device 'MiniLab-090' (for glove box)
Storage-compatible glove box PVD flexible thin film experimental device, featuring a tall chamber with a height of 570mm, contributes to improved uniformity during deposition.
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Vacuum Deposition Device "MiniLab Series"
Due to its modular embedded design, it is possible to flexibly assemble dedicated machines according to the required film formation methods. A compact thin-film experimental device that can accommodate various research applications.
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Vacuum Deposition Device "nanoPVD-T15A"
We have incorporated all the latest vacuum deposition technology into a compact benchtop-sized device that can effectively utilize limited lab space.
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Sputtering device 'MiniLab-026'
Compact and space-saving! Ideal for research and development. Flexible configuration for purposes such as deposition, sputtering, and annealing.
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Vacuum Deposition Device "MiniLab-026"
Compact and space-saving! Ideal for research and development, flexible configuration for purposes such as deposition, sputtering, and annealing.
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Annealing furnace "Mini-BENCH-prism ultra-high temperature experimental furnace"
Maximum operating temperature 2000℃ Semi-automatic control Ultra-high temperature experimental furnace (carbon furnace, tungsten metal furnace) Compact and space-saving experimental furnace
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