Processing methods and treatment methods

Processing methods and treatment methods
【Processing Methods and Treatments】 ◆FIB Method (Focused Ion Beam) ◆Processing for SSDP (Measurement Processing from the Substrate Side) ◆IP Method (Ar Ion Polishing) ◆Processing under Atmosphere Control ◆Cryo Processing
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[IP Method] Ar Ion Polishing Processing
The IP method is a type of polishing technique that uses ion beams for processing.
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Ar ion milling processing
This is a processing method for producing thin film samples for transmission electron microscopy with a thickness of less than 50 nm by performing mechanical polishing followed by finishing with a low-energy Ar ion beam.
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Ultramicrotome processing
This is a processing method for cutting bulk samples using a diamond knife to produce ultra-thin sections for transmission electron microscopy with a thickness of less than 100 nm.
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Treatment under non-atmospheric exposure
It is possible to evaluate the sample in its original state.
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[FIB] Focused Ion Beam Processing
FIB refers to a focused ion beam with a diameter ranging from a few nanometers to several hundred nanometers, which can be used to scan the sample surface to etch or deposit material in specific areas.
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Cryo processing
Cooling and hardening the soft sample to make it machinable.
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[Analysis Case] Investigation of the Causes of Wettability Changes Due to Plasma Treatment
Evaluation of the top surface of modified layers of polymers, resins, and films using TOF-SIMS is possible.
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SSDP-SIM
SSDP: Substrate Side Depth Profile
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Cross-sectional processing using the ion polish method.
A method for removing the surface of a sample by utilizing the sputtering phenomenon, where sample atoms are ejected from the sample surface.
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Electronic dyeing
By bonding heavy elements to polymer chains, the contrast of structures and forms derived from the polymers can be enhanced, allowing for clearer observation under an electron microscope.
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Laser processing
Using an ultra-short pulse laser with micron-level processing position accuracy, samples can be produced quickly and with low damage.
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Structural analysis using Xe-plasma FIB.
Precision processing/structural evaluation is possible over a wide area of several hundred micrometers.
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[Analysis Case] Evaluation of Resistance Values and Li Distribution in Secondary Battery Cathodes
Distribution of resistance values in the electrode cross-section, visualization of conduction paths, and comparison with ion distribution.
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[Analysis Case] Impurity Evaluation of MLCC Using Diagonal Processing MLCC
Evaluation of impurity distribution in ceramic layers using diagonal processing.
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