◉ 【MiniLab-060】Flexible Thin Film Experimental Device
◉ 【MiniLab-060】Flexible Thin Film Experimental Device
A semi-custom-made thin film experimental device that can be flexibly assembled according to your desired configuration, including deposition, sputtering, EB, and annealing modules. Possible combinations from the following deposition sources: - Resistance heating deposition source x up to 4 - Organic deposition source x up to 4 - Electron beam deposition - 2-inch magnetron sputtering cathodes x 4 [Main Specifications] - SUS304 60ℓ volume chamber 400x400x400mm - Pump: Turbo molecular pump, rotary pump (dry pump also available) - Vacuum exhaust: Automatic control of vacuum/vent - Metal film deposition: Up to 4 points - Organic film deposition: Up to 4 points - EB electron beam deposition source: 7cc crucible x 6 (or 4cc crucible x 8) - Φ2 to 4 inch magnetron sputtering cathodes x up to 4 - Process control: Manual/automatic multilayer film and simultaneous deposition, APC automatic control available (*optional) - Film thickness monitor: Quartz crystal oscillator sensor head x 2 - Utilities: Power supply 200V three-phase 13A, water cooling 3ℓ/min, N2 vent gas 0.1Mkpa - Other options: Substrate heating, cooling, substrate elevation/rotation, bias stage, dry pump, load lock
31～41 item / All 41 items
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Sputtering device "MiniLab-060"
A semi-custom-made thin film experimental device that can be assembled with the desired configuration for processes such as sputtering, EB (electron beam), and annealing.
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Vacuum Deposition Device "MiniLab-080"
Flexible configuration available upon request for methods such as deposition, sputtering, and EB. Adopts a tall chamber with a height of 570mm, contributing to improved uniformity during deposition.
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Sputtering device 'nanoPVD-S10A'
High-performance, cost-effective RF/DC magnetron sputtering device for research and development.
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Vacuum deposition device 'MiniLab-090' (for glove box)
Storage-compatible glove box PVD flexible thin film experimental device, featuring a tall chamber with a height of 570mm, contributes to improved uniformity during deposition.
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Vacuum Deposition Device "MiniLab Series"
Due to its modular embedded design, it is possible to flexibly assemble dedicated machines according to the required film formation methods. A compact thin-film experimental device that can accommodate various research applications.
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Vacuum Deposition Device "nanoPVD-T15A"
We have incorporated all the latest vacuum deposition technology into a compact benchtop-sized device that can effectively utilize limited lab space.
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Sputtering device 'MiniLab-026'
Compact and space-saving! Ideal for research and development. Flexible configuration for purposes such as deposition, sputtering, and annealing.
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Vacuum Deposition Device "MiniLab-026"
Compact and space-saving! Ideal for research and development, flexible configuration for purposes such as deposition, sputtering, and annealing.
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Annealing furnace "Mini-BENCH-prism ultra-high temperature experimental furnace"
Maximum operating temperature 2000℃ Semi-automatic control Ultra-high temperature experimental furnace (carbon furnace, tungsten metal furnace) Compact and space-saving experimental furnace
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Multi-functional Sputtering Device 【MiniLab-S060】
A compact multi-thin film device that incorporates sputtering, deposition, electron beam (EB), and annealing thin film modules in a 60-liter volume chamber, suitable for various applications.
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Sputtering Equipment Multifunctional Sputter Device MiniLab-S060A
Compact multi-film device that incorporates sputtering, deposition, EB, and annealing thin film modules in a 60L volume chamber, suitable for various applications.
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