◉ TCF-C500 Ultra High Temperature Small Experimental Furnace Max 2900℃
◉ TCF-C500 Ultra High Temperature Small Experimental Furnace Max 2900℃
Max 2900℃ (Carbon furnace), Max 2400℃ (Metal furnace) - Effective heating area: 70 x 70 x 100 mm Supports various applications in new material development and advanced fundamental technology development sectors such as semiconductors, electronic components, fuel cells, and solar cells. A compact R&D ultra-high-temperature experimental furnace capable of heating small samples up to 2900℃ for experimental purposes. It can conduct various firing experiments such as ultra-high-temperature heating experiments and new material development in the laboratory. ◆ Main Features ◆ - Space-saving - Includes rotary pump and compressor - Interlock: water cut-off alarm, overheating, gas pressure drop ◆ Basic Specifications ◆ - Power supply specifications: AC200V 75A NFB 50/60HZ (C-500) - Max 2900℃ (Carbon furnace), 2400℃ (Metal furnace) - Programmable temperature controller, C thermocouple ◆ Options ◆ - Recorder - Turbo molecular pump - Crucible ◆ Main Applications ◆ - New material development - Fuel cells - Others
1～30 item / All 43 items
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Thin Film Experimental Device - "PRODUCTS GUIDE 2022"
Introduction of various experimental devices for research and development in semiconductors, electronic devices, fuel cells, displays, and thin film experiments.
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【Mini-BENCH】Ultra High Temperature Tabletop Experimental Furnace Max 2000℃
Tabletop small-sized experimental furnace - space-saving, with a maximum operating temperature of 2000°C! We also manufacture metal furnaces for reducing atmospheres.
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MiniLab-WCF Ultra-High Temperature Wafer Annealing Furnace 2000℃
6 to 8 inch ultra-high temperature wafer annealing equipment, a high-performance machine that widely accommodates various purposes from research and development to small-scale production.
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◆ANNEAL◆ Wafer Annealing Equipment
Max 1000℃, maximum 3 systems for MFC, APC pressure control, compatible with 4" or 6" substrates, high vacuum annealing equipment (<5 × 10^-7 mbar)
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◆◇◆ Small Vertical Experimental Furnace for R&D TVF-110 ◆◇◆
Low-cost minimum necessary configuration (manual control) applicable as tubular furnace, diffusion furnace, and thermal CVD.
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BH Series [High-Temperature Thin Film Experiment Substrate Heating Heater] Max 1800℃
This is a heater for thin film experiments such as PVD and CVD, featuring excellent uniformity, heating characteristics, and controllability. RF/DC bias specifications are also available.
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[SH High-Temperature Substrate Heater] For PVD, CVD Max 1100℃
CVD, PVD (evaporation, sputtering, etc.) high vacuum, ultra-high temperature plate heater for wafer and small chip heating with excellent uniformity and reproducibility.
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[Hot Stage] Ultra High Temperature Substrate Heating Stage Max 1800℃
An ultra-high temperature substrate heating stage that allows for substrate elevation, rotation, and RF/DC substrate bias all in one device! 'All-In-One' component.
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◾️Vacuum use 【CH ultra-high temperature cylindrical heater】 Max 1800℃ ◾️
Vacuum Ultra-High Temperature Cylindrical Heater Unit Maximum Temperature 1800°C (Graphite, C/C Composite)
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[Nanofurnace] BWS-NANO Thermal CVD Device
Hot Wall Type Thermal CVD Equipment: A compact, high-performance CVD device ideal for fundamental research.
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MiniLab Series Flexible Thin Film Experiment Device
Due to its modular embedded design, it is possible to flexibly assemble dedicated equipment according to the required film formation method. A compact thin-film experimental device that can accommodate various research applications.
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□■□【MiniLab-026】Flexible Thin Film Experimental Device□■□
Compact and space-saving! Ideal for research and development. Flexible configuration for purposes such as deposition, sputtering, and annealing.
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□■□【MiniLab-060】Flexible Thin Film Experimental Device□■□
A semi-custom-made thin film experimental device that can be assembled with the desired configuration for processes such as evaporation, sputtering, electron beam (EB) deposition, and annealing.
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MiniLab-026/090 Glove Box Thin Film Experiment Device
Compact and space-saving! Ideal for organic thin film development, all processes such as deposition, sputtering, and annealing can be seamlessly performed within the glove box.
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Magnetron Sputtering Cathode
High-efficiency magnetron sputtering cathode compatible with RF, DC, and pulse DC for depositing metals and insulators without impurities. It also excels in maintainability.
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【nanoPVD-S10A】Magnetron Sputtering Device
High-performance, cost-effective RF/DC magnetron sputtering system for research and development.
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◆nanoPVD-T15A◆ High-performance Organic and Metal Film Deposition Equipment
We have incorporated all the latest vacuum deposition technology into a compact benchtop-sized device that can effectively utilize limited lab space.
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nanoCVD-8G Graphene Synthesis Device
◉ Short time: Easily conduct graphene synthesis experiments in just 30 minutes per batch. ◉ High-precision temperature and pressure control. ◉ Sophisticated software.
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【PyroUSB】USB-connected high-precision infrared temperature sensor
USB connection type, parameter settings and data management with the included dedicated software. A wide range of wavelength options is available. Three models can be selected based on your purpose.
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PyroMini USB - USB-connected compact infrared temperature sensor
USB-connected compact infrared temperature sensor, no power supply needed, powered by USB bus power from PC, parameter settings and data management with included dedicated software.
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【PyroMini】Compact High-Performance Infrared Temperature Sensor
Easy setup with a high-performance touch panel converter, data logging, and data storage on a microSD card. PM2.2 can also measure glossy metal surfaces.
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ExTemp intrinsically safe explosion-proof infrared radiation temperature sensor
TIIS (Technical Institution of Industrial Safety) certification obtained for intrinsically safe explosion-proof radiation temperature sensors, suitable for use in hazardous locations (Zone 0, 1, & 2).
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【PyroNFC】Smartphone-configured infrared radiation temperature sensor
Parameters such as temperature range, emissivity, and alarms can be set using a smartphone or tablet, allowing for easy configuration without the need for a display instrument or power supply for the instrument.
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PyroCouple Infrared Temperature Sensor
Compact measurement, robust body, high precision ±1%, 240msec fast response. It can be applied for industrial machine control, temperature monitoring in production sites, and various other purposes.
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Soft Etching Device [nanoETCH]
<30W Low power - Etching control precision 10mW Achieving damage-free and delicate etching processing.
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□■□【MiniLab-080】Flexible Thin Film Experiment Device□■□
Flexible configuration available upon request for processes such as evaporation, sputtering, and EB. Adopts a tall chamber with a height of 570mm, contributing to improved uniformity during evaporation.
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□■□【MiniLab-090】Flexible Thin Film Experimental Device□■□
Storage-compatible glove box PVD flexible thin film experimental device, featuring a tall chamber with a height of 570mm, contributes to improved uniformity during deposition.
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◆Mini-BENCH-prism Semi-Automatic Ultra-High Temperature Experimental Furnace◆
Maximum operating temperature 2000℃ Semi-automatic control Ultra-high temperature experimental furnace (carbon furnace, tungsten metal furnace) Compact and space-saving experimental furnace
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Sputtering and deposition source hybrid thin film device [nanoPVD-ST15A]
Composite thin film experimental device nanoPVD-ST15A capable of mixed installation of vacuum deposition (metal and organic deposition sources) and sputtering cathodes.
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Vacuum Furnace "Mini-BENCH Ultra-High Temperature Tabletop Experimental Furnace"
Tabletop small-sized experimental furnace - space-saving with a maximum operating temperature of 2000℃! We also manufacture metal furnaces for reducing atmospheres.
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