[Analysis Case] Identification of the Crystal Structure and Calculation of the Composition Ratio of HfZrOx Film
More detailed evaluation is possible through combined analysis using XRD and XAFS.
The HfZrOx film, which is attracting attention as a high-k material and ferroelectric, has its physical properties such as dielectric constant significantly affected by its crystal structure. Therefore, identifying the crystal structure and calculating the proportion of each crystal structure are important evaluation criteria. While these can typically be assessed using XRD and XAFS, combining these two methods can provide more detailed information, even in cases where detailed analysis is difficult with just one method. In this instance, we present a case of identifying the crystal structure of HfZrOx films and calculating the proportions of each crystal structure through combined analysis of XRD and XAFS.
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Analysis of LSI and memory.
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