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[Analysis Case] Investigation of Watermark Causes

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[Analysis Case] Investigation of Watermark Causes

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Identification of contamination sources on the outermost surface using TOF-SIMS.

TOF-SIMS detects secondary ions originating from molecules and visualizes their distribution. By estimating the components derived from the ion species detected from abnormal areas, it is possible to investigate which process the anomaly occurred in. When abnormal areas (such as discoloration or adhesion) are found on wafers or products, conducting TOF-SIMS measurements can help distinguish whether the issue is due to watermarks from cleaning and drying, alterations in the base material, or contaminants from a different process, making it effective for identifying the causes of defects.

Related Link - https://www.mst.or.jp/casestudy/tabid/1318/pdid/27…

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Chemical bonding state evaluation and composition distribution evaluation

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[Analysis Case] Watermark Cause Investigation_C0199

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MST is a foundation that provides contract analysis services. We possess various analytical instruments such as TEM, SIMS, and XRD to meet your analysis needs. Our knowledgeable sales representatives will propose appropriate analysis plans. We are also available for consultations at your company, of course. We have obtained ISO 9001 and ISO 27001 certifications. Please feel free to consult us for product development, identifying causes of defects, and patent investigations! MST will guide you to solutions for your "troubles"!

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