[Analysis Case] Investigation of Watermark Causes
Identification of contamination sources on the outermost surface using TOF-SIMS.
TOF-SIMS detects secondary ions originating from molecules and visualizes their distribution. By estimating the components derived from the ion species detected from abnormal areas, it is possible to investigate which process the anomaly occurred in. When abnormal areas (such as discoloration or adhesion) are found on wafers or products, conducting TOF-SIMS measurements can help distinguish whether the issue is due to watermarks from cleaning and drying, alterations in the base material, or contaminants from a different process, making it effective for identifying the causes of defects.
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Applications/Examples of results
Chemical bonding state evaluation and composition distribution evaluation