[Analysis Case] Evaluation of the Diffusion Layer Distribution of a Transistor (MOSFET)

Evaluation of diffusion layers in specific areas using SCM.

最終更新日 Mar 13, 2025

[Analysis Case] Structural Observation of the Hall Side Wall ONO Film

Planar TEM observation of specific areas using the FIB method.

最終更新日 Mar 13, 2025

[Analysis Case] High-Precision Analysis of Ultra-Shallow Dopant Distribution Using SIMS

Can be evaluated with high reproducibility.

最終更新日 Mar 13, 2025

[Analysis Case] Investigation of Contamination Causes on Silicon Wafers

Evaluation of contamination originating from gloves

最終更新日 Mar 13, 2025

[Analysis Case] Evaluation of the Surface Silanol Groups

Quantitative evaluation of silanol groups is possible with TOF-SIMS.

最終更新日 Mar 13, 2025

[Analysis Case] Analysis of H termination on Si surface

Qualitative and relative comparison of SiH and states on the Si surface due to differences in processing.

最終更新日 Mar 13, 2025

[Analysis Case] Evaluation of Ultra-Shallow Implant Profiles by SIMS

Evaluation of dopant distribution and junctions is possible even in extremely shallow regions.

最終更新日 Mar 13, 2025

[Analysis Case] Distortion Analysis in the Field of Element Separation

NBD: Strain analysis of micro-regions using Nano Beam Diffraction.

最終更新日 Mar 13, 2025

[Analysis Case] Cross-sectional Observation of TEM/SEM Organic EL and Gate Oxide Film

Low-acceleration STEM observation allows for contrast even in low-density membranes.

最終更新日 Mar 13, 2025

[Analysis Case] Discrimination between Anatase and Rutile Types of Titanium Dioxide

TEM-EELS enables elemental identification and chemical state analysis in micro-regions.

最終更新日 Mar 13, 2025

[Analysis Case] Evaluation of B Penetration Amount from SSDP-SIMS Gate to Substrate

Measurement avoiding the effects of surface irregularities and high concentration layers using SSDP-SIMS.

最終更新日 Mar 13, 2025

[Analysis Case] IGZO

Case studies of XRD and XRR analysis of oxide semiconductors.

最終更新日 Mar 13, 2025

[Analysis Case] Investigation of Causes of Peeling in Plating and Coating

Identification of contamination sources on the cleavage surface using TOF-SIMS.

最終更新日 Mar 13, 2025

[Analysis Case] Component Identification of Foreign Substances Considering Thermal History

Proposal for the use of standard samples with aligned thermal history.

最終更新日 Mar 13, 2025

[Analysis Case] Depth Direction Analysis of Polyimide Components

Evaluation of the depth direction of surface modification layers of polymers, resins, and films using TOF-SIMS is possible.

最終更新日 Mar 13, 2025

[Analysis Case] Evaluation of Film-Forming Component Encroachment on the Back Surface of the Wafer

Quantitative evaluation of metal components is possible near the bevel area.

最終更新日 Mar 13, 2025

[Analysis Case] Evaluation of Crystal Structure by Micro XRD Analysis

XRD measurements in micro areas are possible.

最終更新日 Mar 13, 2025

[Analysis Case] Evaluation of Silicon (Si) Oxide Film State

It is possible to capture molecular information of inorganic substances in the depth direction using TOF-SIMS.

最終更新日 Mar 13, 2025

[Analysis Case] Distribution and State Evaluation of OH on Aluminum (Al) Surface

It is possible to capture molecular information of inorganic substances in the depth direction using TOF-SIMS.

最終更新日 Mar 13, 2025

[Analysis Case] Evaluation of Si Natural Oxidation Film Thickness

Estimation of film thickness using the average free path of photoelectrons.

最終更新日 Mar 13, 2025

[Analysis Case] SIMS Measurement of Specially Shaped Samples

Analysis is possible even for special shapes through innovative fixing methods.

最終更新日 Mar 13, 2025

[Analysis Case] Evaluation of Foreign Substances on the Surface of 300mm Wafers

The coordinate linkage function with the foreign object inspection device allows for the evaluation of specific foreign objects.

最終更新日 Mar 13, 2025

[Analysis Case] Evaluation of the Cleaning Effect of Organic Ingredients

You can measure the 300mm wafer as it is.

最終更新日 Mar 13, 2025

Analysis case: Evaluation of the in-plane distribution of additives in solder alloys.

Capable of highly sensitive evaluation of the distribution of additives at the ppm level.

最終更新日 Mar 13, 2025

Quantification of Hydrogen Bonding States in SiN Films

Quantification of Si-H and N-H in SiN films using infrared absorption method.

最終更新日 Mar 13, 2025

Evaluation of the ionization potential of semiconductors

UPS: Ultraviolet Photoelectron Spectroscopy

最終更新日 Mar 12, 2025

Analysis of crystal grains below 30nm using the EBSD method.

EBSD: Electron Backscatter Diffraction

最終更新日 Mar 12, 2025

Interference peak removal process in quantitative analysis

X-ray photoelectron spectroscopy (XPS)

最終更新日 Mar 12, 2025

Regarding the depth conversion of SRA

SRA: Spread Resistance Measurement Method

最終更新日 Mar 12, 2025

About the concentration conversion of SRA.

SRA: Spread Resistance Measurement Method

最終更新日 Mar 12, 2025