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[Analysis Case] Evaluation of Si Natural Oxidation Film Thickness

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[Analysis Case] Evaluation of Si Natural Oxidation Film Thickness

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c0279.jpg

Estimation of film thickness using the average free path of photoelectrons.

We will introduce a case where the thickness of extremely thin films, such as natural oxide films on silicon wafers and silicon nitride thin films, which are less than a few nanometers thick, was calculated using XPS analysis. By measuring the Si2p spectrum of the surface of the Si wafer and performing waveform analysis on the obtained spectrum, we can determine the ratio of the presence of each bonding state, and from this result, it is possible to estimate the film thickness based on the average free path of photoelectrons (Equation 1). XPS allows for non-destructive and simple calculation of thin film thickness on substrates as broad average information.

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