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[Analysis Case] Distribution and State Evaluation of OH on Aluminum (Al) Surface

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[Analysis Case] Distribution and State Evaluation of OH on Aluminum (Al) Surface

c0262.jpg
c0262.jpg

It is possible to capture molecular information of inorganic substances in the depth direction using TOF-SIMS.

The presence of OH and fluoride on the surface of aluminum electrodes is one of the causes of electrode corrosion, and investigating the state of the aluminum surface is essential for identifying the causes of defects. TOF-SIMS excels in depth resolution at the very surface and can measure depth distribution with high sensitivity while monitoring the state of inorganic substances. By evaluating the depth distribution along with OH, we discovered a phenomenon where OH increased without a change in the thickness of the oxide film. In this way, TOF-SIMS enables the evaluation of depth distribution of molecular information of inorganic substances that cannot be obtained through elemental analysis.

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[Analysis Case] Distribution and State Evaluation of OH on Aluminum (Al) Surface_C0262

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