Interference peak removal process in quantitative analysis
X-ray photoelectron spectroscopy (XPS)
In XPS analysis, in addition to the photoelectron peaks used for evaluation, photoelectron peaks from other orbitals and Auger peaks from X-ray excitation are also detected. Depending on the combination of elements, these sub-peaks can overlap with the target peak and interfere with the evaluation. *Typically, a strong photoelectron peak emitted from an inner shell level close to the outer shell is used. In the quantitative calculations of XPS analysis, the removal of such interfering peaks is primarily performed using the following two methods: 1. Removal using sensitivity coefficient ratios 2. Removal using waveform separation
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For detailed data, please refer to the catalog.
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Applications/Examples of results
Analysis of lighting, power devices, LSI, memory, electronic components, manufacturing equipment, parts, and biotechnology.