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[Analysis Case] Evaluation of Layer Structure and Film Thickness of Naturally Oxidized Copper (Cu) Surface Film

C0373.png

[Analysis Case] Evaluation of Layer Structure and Film Thickness of Naturally Oxidized Copper (Cu) Surface Film

C0373.png
C0373.png

Depth-direction state evaluation using TOF-SIMS.

The surface of copper (Cu) metal exposed to the atmosphere is covered with a natural oxide film, and it is known that such copper surfaces can be broadly classified into the states of "Cu," "Cu2O," "CuO," and "Cu(OH)2." By conducting depth profile analysis of commercially available standard powders of "Cu2O," "CuO," and "Cu(OH)2" using TOF-SIMS, it was found that it is possible to obtain characteristic molecular ions corresponding to each state. Using these molecular ions, it became possible to evaluate the depth profile of the natural oxide film on the surface of metallic Cu. Measurement method: TOF-SIMS. Product fields: Display, LSI, Memory, Electronic components. Analysis purpose: Evaluation of chemical bonding states. For more details, please download the materials or contact us.

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Analysis of displays, LSI, memory, and electronic components.

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[Analysis Case] Layer Structure and Film Thickness Evaluation of Natural Oxide Film on Copper (Cu) _C0373

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