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[Analysis Case] Removal of Organic Contaminants by Etching

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[Analysis Case] Removal of Organic Contaminants by Etching

We will remove surface contamination and conduct an evaluation using XPS.

XPS is a surface-sensitive technique, so carbon derived from organic contaminants due to the atmosphere is detected at a significant level. Reducing the influence of this carbon from organic contaminants is important for evaluating the original composition of the film. Typically, Ar ion sputtering is used to remove organic contaminants, but damage caused by sputtering may prevent the evaluation of the film's original composition and bonding states. We present an example where the influence of carbon from organic contaminants was reduced by removing the surface oxide layer using wet etching instead of Ar ion sputtering.

Related Link - https://www.mst.or.jp/casestudy/tabid/1318/pdid/20…

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For detailed data, please refer to the catalog.

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Analysis of LSI, memory, oxide semiconductors, power devices, optical devices, manufacturing equipment, and components.

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[Analysis Case] Removal of Organic Contaminants by Etching_C0383

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