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[Analysis Case] Removal of Organic Contaminants by Etching

c0383.jpg

[Analysis Case] Removal of Organic Contaminants by Etching

c0383.jpg
c0383.jpg

We will remove surface contamination and conduct an evaluation using XPS.

XPS is a surface-sensitive technique, so carbon derived from organic contaminants due to the atmosphere is detected at a significant level. Reducing the influence of this carbon from organic contaminants is important for evaluating the original composition of the film. Typically, Ar ion sputtering is used to remove organic contaminants, but damage caused by sputtering may prevent the evaluation of the film's original composition and bonding states. We present an example where the influence of carbon from organic contaminants was reduced by removing the surface oxide layer using wet etching instead of Ar ion sputtering.

Related Link - https://www.mst.or.jp/casestudy/tabid/1318/pdid/20…

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Analysis of LSI, memory, oxide semiconductors, power devices, optical devices, manufacturing equipment, and components.

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[Analysis Case] Removal of Organic Contaminants by Etching_C0383

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MST is a foundation that provides contract analysis services. We possess various analytical instruments such as TEM, SIMS, and XRD to meet your analysis needs. Our knowledgeable sales representatives will propose appropriate analysis plans. We are also available for consultations at your company, of course. We have obtained ISO 9001 and ISO 27001 certifications. Please feel free to consult us for product development, identifying causes of defects, and patent investigations! MST will guide you to solutions for your "troubles"!

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