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[Analysis Case] Surface Contamination Assessment of Si Wafers Stored Using TOF-SIMS

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[Analysis Case] Surface Contamination Assessment of Si Wafers Stored Using TOF-SIMS

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c0120.jpg

Evaluation of contamination and oxidation of Si wafers after removing the oxide film with hydrofluoric acid treatment.

Knowledge about the effects of contamination and oxidation during sample transport is important in surface analysis where the detection depth is on the nanometer order. Therefore, we examined the impact of contamination and oxidation due to differences in storage methods on Si wafers. In storage with wrapping paper and aluminum foil, there is a tendency for the peaks of organic materials caused by secondary contamination to be weaker. When samples are wrapped and stored in the matte side of aluminum foil during storage and transport, it can suppress contamination and oxidation compared to other storage methods.

Related Link - https://www.mst.or.jp/casestudy/tabid/1318/pdid/19…

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Analysis of LSI, memory, and electronic components.

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[Analysis Case] Surface Contamination Assessment of Si Wafers Based on Storage Conditions Using TOF-SIMS_C0120

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