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The influence of adsorbed oxygen in XPS.

XPS: X-ray Photoelectron Spectroscopy

XPS is a method for obtaining information about the composition and bonding state of the sample surface (to a depth of about several nanometers), but by combining it with ion irradiation for sputter etching, it is also possible to evaluate the internal structure of the sample and depth distribution. However, in evaluations involving sputter etching, due to the principles and measurement mechanisms of XPS, the amount of oxygen may be overestimated due to the influence of adsorbed oxygen, so caution is required. In the case of evaluating samples that easily adsorb oxygen (such as Ti, TiN, AlN, etc.) or focusing on trace amounts of oxygen, the influence of adsorbed oxygen becomes significant, so comparisons between samples and analyses using SIMS are recommended.

Related Link - https://www.mst.or.jp/casestudy/tabid/1318/pdid/43…

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Analysis of power devices, LSI, and memory.

The influence of adsorbed oxygen in XPS_B0240

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