X-ray Reflectivity Method

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XRR：X-ray Reflectivity

XRR measures the reflection intensity of X-rays incident on the sample surface at a very shallow angle. By comparing the reflection X-ray intensity profile obtained from this measurement with simulation results and optimizing the simulation parameters, this method determines the film thickness and density of the sample. - Evaluation of film thickness is possible (approximately 2 to 300 nm) - Evaluation of density is possible - Evaluation of surface roughness is possible (Rms ≤ 5 nm) - Non-destructive analysis is possible - Average information over a wide area of approximately 10×20 mm can be obtained

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The "critical angle (θc)" refers to the smallest angle of incidence at which total internal reflection occurs when light travels from a medium with a higher refractive index to one with a lower refractive index. When X-rays are incident on a sample at a very shallow angle, if the angle of incidence is smaller than the critical angle, all the incident X-rays are reflected (total reflection). As the angle of incidence is gradually increased, when it becomes larger than the critical angle, the X-rays penetrate the thin film, and the intensity of the reflected X-rays decreases. Further increasing the angle of incidence causes the X-rays reflected from the surface of the thin film and those reflected from each interface to interfere with each other, resulting in an observed oscillation profile. The oscillation profile of the reflectivity obtained in this way corresponds to a specific profile based on the material's d: film thickness, ρ: density, and σ: roughness. By assuming a film structure and conducting simulations, we evaluate the film thickness, density, and roughness by optimizing each parameter so that the measured values match the simulation results.

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Applications/Examples of results

- Evaluation of film density of thin films and film thickness (Evaluation of film density and film thickness for Si oxide films, Low-k films, magnetic materials, metal films, organic EL, amorphous films, etc.) - Evaluation of film density of stacked films - Evaluation of density and film thickness of interface layers