◆nanoPVD-T15A◆ High-performance organic and metal film deposition device
◆nanoPVD-T15A◆ High-performance organic and metal film deposition device
Ideal for organic thin film deposition applications such as OLED, OPV, and OTFT. Utilizes low-temperature organic deposition sources with excellent temperature responsiveness/stability and high-temperature deposition sources for metal films. Despite its compact size, it achieves performance similar to standalone large machines without sacrificing basic performance, film quality, uniformity, or operability. Intuitive and easy-to-use HMI. Connects to a Windows PC via USB cable for log saving and automatic film deposition recipe creation and storage. ◉ Dimensions: 804(W) x 530(D) x 600(H) mm ◉ Weight: 40–70 kg (depending on equipment configuration) ◉ Excellent basic performance ・Achieved vacuum level of 5x10-5 Pascal ・Turbo molecular pump ・Φ2" or Φ4" substrates ◉ Deposition sources ・Metal deposition source x up to 2 units ・Organic deposition source x up to 4 units (up to 2 units if mixed with resistance heating TE) ◉ 7" touch panel ◉ Continuous film deposition ・Automatic control of deposition programs ・30 types of registered recipes ・High-precision wide-range vacuum gauge ◉ Abundant options ・Substrate rotation ・Vertical lift with 300 mm stroke ・Substrate and source shutters ・Dry pump ・Connects to Windows PC via USB for log saving and management
1～30 item / All 45 items
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Thin Film Experimental Device - "PRODUCTS GUIDE 2022"
Introduction of various experimental devices for research and development in semiconductors, electronic devices, fuel cells, displays, and thin film experiments.
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◆nanoPVD-T15A◆ High-performance Organic and Metal Film Deposition Equipment
We have incorporated all the latest vacuum deposition technology into a compact benchtop-sized device that can effectively utilize limited lab space.
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【nanoPVD-S10A】Magnetron Sputtering Device
High-performance, cost-effective RF/DC magnetron sputtering system for research and development.
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◆ANNEAL◆ Wafer Annealing Equipment
Max 1000℃, maximum 3 systems for MFC, APC pressure control, compatible with 4" or 6" substrates, high vacuum annealing equipment (<5 × 10^-7 mbar)
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【Mini-BENCH】Ultra High Temperature Tabletop Experimental Furnace Max 2000℃
Tabletop small-sized experimental furnace - space-saving, with a maximum operating temperature of 2000°C! We also manufacture metal furnaces for reducing atmospheres.
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nanoCVD-8G Graphene Synthesis Device
◉ Short time: Easily conduct graphene synthesis experiments in just 30 minutes per batch. ◉ High-precision temperature and pressure control. ◉ Sophisticated software.
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[Nanofurnace] BWS-NANO Thermal CVD Device
Hot Wall Type Thermal CVD Equipment: A compact, high-performance CVD device ideal for fundamental research.
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Magnetron Sputtering Cathode
High-efficiency magnetron sputtering cathode compatible with RF, DC, and pulse DC for depositing metals and insulators without impurities. It also excels in maintainability.
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□■□【MiniLab-026】Flexible Thin Film Experimental Device□■□
Compact and space-saving! Ideal for research and development. Flexible configuration for purposes such as deposition, sputtering, and annealing.
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□■□【MiniLab-060】Flexible Thin Film Experimental Device□■□
A semi-custom-made thin film experimental device that can be assembled with the desired configuration for processes such as evaporation, sputtering, electron beam (EB) deposition, and annealing.
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MiniLab-026/090 Glove Box Thin Film Experiment Device
Compact and space-saving! Ideal for organic thin film development, all processes such as deposition, sputtering, and annealing can be seamlessly performed within the glove box.
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MiniLab Series Flexible Thin Film Experiment Device
Due to its modular embedded design, it is possible to flexibly assemble dedicated equipment according to the required film formation method. A compact thin-film experimental device that can accommodate various research applications.
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BH Series [High-Temperature Thin Film Experiment Substrate Heating Heater] Max 1800℃
This is a heater for thin film experiments such as PVD and CVD, featuring excellent uniformity, heating characteristics, and controllability. RF/DC bias specifications are also available.
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[SH High-Temperature Substrate Heater] For PVD, CVD Max 1100℃
CVD, PVD (evaporation, sputtering, etc.) high vacuum, ultra-high temperature plate heater for wafer and small chip heating with excellent uniformity and reproducibility.
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[Hot Stage] Ultra High Temperature Substrate Heating Stage Max 1800℃
An ultra-high temperature substrate heating stage that allows for substrate elevation, rotation, and RF/DC substrate bias all in one device! 'All-In-One' component.
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◾️Vacuum use 【CH ultra-high temperature cylindrical heater】 Max 1800℃ ◾️
Vacuum Ultra-High Temperature Cylindrical Heater Unit Maximum Temperature 1800°C (Graphite, C/C Composite)
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MiniLab-WCF Ultra-High Temperature Wafer Annealing Furnace 2000℃
6 to 8 inch ultra-high temperature wafer annealing equipment, a high-performance machine that widely accommodates various purposes from research and development to small-scale production.
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TCF-C500 Ultra-High Temperature Small Experimental Furnace Max 2900℃
Compact, space-saving, energy-efficient! High-performance ultra-high temperature experimental furnace for R&D.
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◆◇◆ Small Vertical Experimental Furnace for R&D TVF-110 ◆◇◆
Low-cost minimum necessary configuration (manual control) applicable as tubular furnace, diffusion furnace, and thermal CVD.
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Products Guide: "Ultra-High Temperature Experimental Furnace Product Guide"
Introducing the Thermocera Japan research and development experimental furnace. It can be utilized for material development such as fuel cells and ceramics, as well as ultra-high temperature experiments involving graphite and more.
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【PyroUSB】USB-connected high-precision infrared temperature sensor
USB connection type, parameter settings and data management with the included dedicated software. A wide range of wavelength options is available. Three models can be selected based on your purpose.
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PyroMini USB - USB-connected compact infrared temperature sensor
USB-connected compact infrared temperature sensor, no power supply needed, powered by USB bus power from PC, parameter settings and data management with included dedicated software.
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【PyroMini】Compact High-Performance Infrared Temperature Sensor
Easy setup with a high-performance touch panel converter, data logging, and data storage on a microSD card. PM2.2 can also measure glossy metal surfaces.
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ExTemp intrinsically safe explosion-proof infrared radiation temperature sensor
TIIS (Technical Institution of Industrial Safety) certification obtained for intrinsically safe explosion-proof radiation temperature sensors, suitable for use in hazardous locations (Zone 0, 1, & 2).
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【PyroNFC】Smartphone-configured infrared radiation temperature sensor
Parameters such as temperature range, emissivity, and alarms can be set using a smartphone or tablet, allowing for easy configuration without the need for a display instrument or power supply for the instrument.
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PyroCouple Infrared Temperature Sensor
Compact measurement, robust body, high precision ±1%, 240msec fast response. It can be applied for industrial machine control, temperature monitoring in production sites, and various other purposes.
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Soft Etching Device [nanoETCH]
<30W Low power - Etching control precision 10mW Achieving damage-free and delicate etching processing.
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□■□【MiniLab-080】Flexible Thin Film Experiment Device□■□
Flexible configuration available upon request for processes such as evaporation, sputtering, and EB. Adopts a tall chamber with a height of 570mm, contributing to improved uniformity during evaporation.
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□■□【MiniLab-090】Flexible Thin Film Experimental Device□■□
Storage-compatible glove box PVD flexible thin film experimental device, featuring a tall chamber with a height of 570mm, contributes to improved uniformity during deposition.
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◆Mini-BENCH-prism Semi-Automatic Ultra-High Temperature Experimental Furnace◆
Maximum operating temperature 2000℃ Semi-automatic control Ultra-high temperature experimental furnace (carbon furnace, tungsten metal furnace) Compact and space-saving experimental furnace
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