BH Series [High-Temperature Thin Film Experiment Substrate Heating Heater] Max 1800℃
This is a heater for thin film experiments such as PVD and CVD, featuring excellent uniformity, heating characteristics, and controllability. RF/DC bias specifications are also available.
High vacuum compatible with a variety of heater material options. Applicable for various vacuum thin film experiments such as PVD (sputtering, evaporation, EB, etc.), CVD, high-temperature vacuum annealing, and high-temperature sample analysis substrate stages. Custom-made solutions are available to meet various specifications. 【Features】 ● Semi-custom product. Designed and manufactured according to your requirements. ● Easy replacement of spare heater wires. ● Easy installation and maintenance (M6 stud bolts, supports). ● Compatible with RF/DC bias and substrate rotation. 【Standard Accessories】 ● Thermocouple: wire type with alumina insulating sleeve. ● Mounting stud bolts. 【Options】 ● RF (150W)/DC (1KW) bias application. ● Non-standard heater wires (Nb, Mo, Pt/Re, WRe, etc.). ● Substrate holding clips. ● Mounting brackets. ● Substrate holders. ● Tapped holes for holder installation. ● Change of top plate material (PBN, quartz, carbon, Inconel, etc.). ● Additional thermocouples for overheating protection. ● Base flange, vacuum feedthrough.
basic information
【Supported Substrate Size】 ◉ Φ1inch to Φ6inch 【Thermocouple】 ◉ Type K or Type C 【Heater Wire Material】 ◉ Max 1800℃: Graphite, C/C composite wire (in vacuum, Ar, N2) ◉ Max 1500℃: SiC coated wire (in vacuum, Ar, N2, O2) ◉ Max 1600℃: Tungsten wire (in vacuum, Ar, N2, He, H2) ◉ Max 1400℃: Tantalum wire (in vacuum, Ar, N2, He, H2) ◉ Max 900℃: Kanthal wire (in vacuum, Ar, N2, He, O2, H2) ◉ Max 900℃: NiCr wire (in vacuum, Ar, N2, He, H2, O2, atmosphere)
Price information
For more details, please contact our company.
Price range
P3
Delivery Time
OTHER
Delivery dates may vary depending on specifications; please contact us for more information.
Model number/Brand name
BHS series
Applications/Examples of results
PVD (sputtering, ALD, PLD, etc.) CVD substrate heating heaters, sample heating stages for analytical instruments, high-temperature substrate heating stages and holders, etc.
Detailed information
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◆HTE Heater◆ High Vacuum Crucible Heating Heater Max 1500℃
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★★Thermosera Japan_Thin Film Experimental Equipment_"PRODUCTS GUIDE 2022"★★
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Hot Stage [Substrate Heating Mechanism] Ultra-High Temperature Substrate Heating Stage Max 1800℃ _ Φ2 to Φ6 inch
High-temperature substrate heating mechanism for vacuum thin film processes, used for the development of semiconductors, electronic devices, etc. It can be utilized for various film deposition experiments on silicon substrates, sapphire substrates, compound substrates, and others. Selection of elements and materials according to ultra-high temperature substrate heating conditions (Max 1800°C) for vacuum equipment such as CVD and sputtering is possible. ◉ Compatible with ultra-high vacuum, inert gas, O2, and various process gas atmospheres. ◉ Substrate up/down/rotation mechanism and RF/DC bias application possible. ◉ Selection of elements according to the atmosphere: NiCr, Inconel, Tungsten, Graphite, CC composite, Graphite (SiC coating, PBN coating) CC composite (PG coating) ◉ Various vacuum flange connections: ICF, VF ◉ Thermocouple included ◉ Other options: Motor controller, temperature control unit, transbox.
