[Nanofurnace] BWS-NANO Thermal CVD Device
Hot Wall Type Thermal CVD Equipment: A compact, high-performance CVD device ideal for fundamental research.
◉ Graphene, carbon nanotubes ◉ ZnO nanowires ◉ Insulating films such as SiO2 Others, compatible with a wide range of applications as a hot-wall thermal CVD system.
basic information
**Features** ◉ High-quality film deposition experiments possible with a compact system ◉ Uniform heating of the reaction tube using a hot-wall design ◉ High-precision flow control with 4 channels (CH4, Ar, H2, for bubbler): Accuracy ±1% F.S. ◉ High-precision APC pressure control using a capacitance manometer (Baratron gauge) ◉ Remote control and data analysis via Lab View software (optional) **Main Specifications** ◉ Φ2.5 inch (standard) Φ4 inch x 12 inch quartz reaction tube ◉ Maximum operating temperature 1100℃ ◉ Sample size: 10x10mm, (Φ2.5 inch) 100 x 100mm (Φ4 inch) ◉ PID temperature control: Eurotherm 2416 programmable temperature controller ◉ Flow control: ±1% F.S. 0 sccm to 100, or 1000 sccm (depending on gas type) ◉ Includes rotary pump
Price information
Please contact us.
Delivery Time
Model number/Brand name
BWS-NANO
Applications/Examples of results
Graphene, carbon nanotubes ZnO nanowires Nanodiamond Insulating films, protective films (SiC, TiN, etc.) Others, general applications of thermal CVD equipment
Detailed information
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【Endless possibility_thermal engineering...】 Our company sells vacuum thin film devices for semiconductor and electronic device fundamental research, ultra-high temperature heaters for CVD substrate heating, experimental furnaces, temperature measurement equipment, and more. To meet the endless demand for "heat," which is indispensable in any era, and to respond to various requests in the field of fundamental technology development, we aim to introduce the latest equipment and contribute to research and development in Japan.