[Nanofurnace] BWS-NANO Thermal CVD Device
Hot Wall Type Thermal CVD Equipment: A compact, high-performance CVD device ideal for fundamental research.
◉ Graphene, carbon nanotubes ◉ ZnO nanowires ◉ Insulating films such as SiO2 Others, compatible with a wide range of applications as a hot-wall thermal CVD system.
basic information
**Features** ◉ High-quality film deposition experiments possible with a compact system ◉ Uniform heating of the reaction tube using a hot-wall design ◉ High-precision flow control with 4 channels (CH4, Ar, H2, for bubbler): Accuracy ±1% F.S. ◉ High-precision APC pressure control using a capacitance manometer (Baratron gauge) ◉ Remote control and data analysis via Lab View software (optional) **Main Specifications** ◉ Φ2.5 inch (standard) Φ4 inch x 12 inch quartz reaction tube ◉ Maximum operating temperature 1100℃ ◉ Sample size: 10x10mm, (Φ2.5 inch) 100 x 100mm (Φ4 inch) ◉ PID temperature control: Eurotherm 2416 programmable temperature controller ◉ Flow control: ±1% F.S. 0 sccm to 100, or 1000 sccm (depending on gas type) ◉ Includes rotary pump
Price information
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Delivery Time
Model number/Brand name
BWS-NANO
Applications/Examples of results
Graphene, carbon nanotubes ZnO nanowires Nanodiamond Insulating films, protective films (SiC, TiN, etc.) Others, general applications of thermal CVD equipment
Detailed information
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◆HTE Heater◆ High Vacuum Crucible Heating Heater Max 1500℃
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★★Thermosera Japan_Thin Film Experimental Equipment_"PRODUCTS GUIDE 2022"★★
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