□■□【MiniLab-026】Flexible Thin Film Experimental Device□■□
Compact and space-saving! Ideal for research and development. Flexible configuration for purposes such as deposition, sputtering, and annealing.
This is a flexible R&D thin film experimental device that achieves minimal waste, compact size, simple operation, and high cost performance by integrating the necessary minimum modules and controllers into a 19" compact rack with a Plug&Play feel. It supports magnetron sputtering (up to 3 sources) or resistance heating evaporation (metal sources up to 4, organic materials x4), and it can also be equipped with a substrate heating stage for annealing and plasma etching. A glove box storage type is also available (*specifications to be discussed). We offer a wide range of optional components that can be flexibly customized. ◉ Maximum substrate size: Φ6 inch ◉ Resistance heating evaporation source filament, crucible, boat type (up to 4 sources) ◉ Organic evaporation source: 1cc or 5cc ◉ Φ2 inch magnetron cathode (up to 3 sources) ◉ Dry etching ◉ Glove box compatible (optional, specifications to be discussed) ◉ Other options: simultaneous deposition from 2 sources, HiPIMS, automatic thin film controller, custom substrate holder, substrate rotation/lifting, substrate heating, and many other options available. *Please first contact us with your required specifications, and we will configure the system to meet your needs.
basic information
The MiniLab-026 is a compact thin film experimental device that uses the smallest 26L volume chamber in the series. 【Small Footprint & Space-Saving】 - Single rack type (MiniLab-026): 590(W) x 590(D)mm 【Excellent Operability & Intuitive Operation Screen】 Windows PC or 7” touch panel. Easy operation that does not require expertise, with maximum safety considerations. 【Main Specifications】 ◉ Chamber: SUS304 clamshell type ◉ All components housed in a 19-inch single rack ◉ Resistance heating evaporation source (up to 4 sources), organic evaporation source (up to 4 sources), or Φ2" magnetron (up to 3 units), substrate heating stage, etc. ◉ High precision film thickness control ◉ Turbo molecular pump + rotary pump (dry pump option) ◉ Glove box connection specification (*specification consultation required) ◉ Abundant options: substrate heating/cooling, rotation, special substrate holder, etc. *For more detailed specifications of the MiniLab series, please contact us.
Price range
Delivery Time
Model number/Brand name
MiniLab-026
Applications/Examples of results
- Electronic components - Optical film - Anti-reflective film - Organic transistors, organic EL
Detailed information
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Helical Coil Filament Model. MiniLab-LT26A Chamber Layout *The photo shows a three-pole type. It is a base chamber equipped with numerous spare ports, allowing for easy rearrangement and expansion.
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Basket type thermal source for MiniLab-LT26A resistance heating evaporation device, basket type x4 pole type.
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Organic material evaporation source cell LTES-1cc or 5cc Organic source cell for MiniLab series Easy to attach and detach the crucible during material replenishment Alumina or quartz crucible Temperature control range 80 to 600°C UHV compatible High-precision PID automatic film thickness loop control is possible with dedicated controllers LTEC-1S (1ch) and LTEC-4S (4ch) (±0.1Å/sec)
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LT26A_Glovebox-system-installed-1 LT26A_Glovebox-system-installed-1
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LT26A_Glovebox-system-installed-2 LT26A_Glovebox-system-installed-2
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【Endless possibility_thermal engineering...】 Our company sells vacuum thin film devices for semiconductor and electronic device fundamental research, ultra-high temperature heaters for CVD substrate heating, experimental furnaces, temperature measurement equipment, and more. To meet the endless demand for "heat," which is indispensable in any era, and to respond to various requests in the field of fundamental technology development, we aim to introduce the latest equipment and contribute to research and development in Japan.