[Hot Stage] Ultra High Temperature Substrate Heating Stage Max 1800℃
An ultra-high temperature substrate heating stage that allows for substrate elevation, rotation, and RF/DC substrate bias all in one device! 'All-In-One' component.
Semiconductors, electronic substrates, vacuum thin film process equipment and research and development【Ultra-high temperature substrate heating mechanism】 Compatible substrate sizes: Φ2 to 6 inches Can be used in vacuum (UHV compatible), inert gas, O2, and various process reactive gas atmospheres, etc. (Details to be discussed separately)
basic information
◉ Compatible with ultra-high vacuum, inert gas atmosphere, and various other process gas atmospheres ◉ Stage vertical movement (substrate or heater elevation, two-stage elevation for substrate & heater) ◉ Substrate rotation ◉ RF (1KW)/DC (800V) bias application (reverse sputtering) ◉ Selection of elements according to the operating environment: Graphite, CC composite, halogen lamp heater, graphite/SiC coating, graphite/PBN coating, PG coating, AlN heater ◉ Various vacuum flange connections: ICF, ISO (KF/LF), JIS (VG/VF) flanges ◉ K, C, R thermocouples included ◉ Other options: temperature control unit, Inc, graphite or SiC substrate holder
Price information
For details, please contact our company. Prices may vary depending on specifications, so feel free to contact us.
Delivery Time
Applications/Examples of results
【Applications】 CVD/PVD (vacuum deposition/sputtering equipment), various high-temperature annealing applications, etc. 【Examples】 - TCVD, PECVD, sputtering and other film deposition equipment - High-temperature upgrades of existing thin film equipment heating stages, installation of additional mechanisms for up/down, rotation, and bias - Installation on new process evaluation machines and prototype machines
Detailed information
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【Endless possibility_thermal engineering...】 Our company sells vacuum thin film devices for semiconductor and electronic device fundamental research, ultra-high temperature heaters for CVD substrate heating, experimental furnaces, temperature measurement equipment, and more. To meet the endless demand for "heat," which is indispensable in any era, and to respond to various requests in the field of fundamental technology development, we aim to introduce the latest equipment and contribute to research and development in Japan.