[SH High-Temperature Substrate Heater] For PVD, CVD Max 1100℃
CVD, PVD (evaporation, sputtering, etc.) high vacuum, ultra-high temperature plate heater for wafer and small chip heating with excellent uniformity and reproducibility.
This is a film deposition device and high vacuum compatible hot plate for vacuum thin film experiments, featuring a heater plate made of Inconel or BN plate, with excellent thermal radiation efficiency and superior uniformity. 【Product Lineup】 ◎ SH-IN (Inconel Plate): φ1.0 to φ6.1 inch for vacuum, O2, and active gases ◎ SH-BN (BN Plate, Mo Cover): φ2.1 to φ6.1 inch for vacuum and inert gases 【Features】 ◎ Maximum temperature 1100℃ (SH-BN), 850℃ (SH-IN) ◎ Rapid heating ◎ In-plane temperature distribution within ±2% ◎ Control accuracy and reproducibility ±1℃ ◎ Low cost ◎ Short delivery time (standard about 2 weeks *excluding flanges, rotation and vertical mechanisms, mounting brackets, etc.)
basic information
This is a highly reliable high-temperature vacuum plate heater with numerous adoption records for vacuum thin film experiments at universities and government research institutions. It features terminals that have been treated with discharge prevention insulation for high vacuum, and it incorporates a resistance heating block designed to achieve uniform heating at ultra-high temperatures, allowing the heater plate surface to be rapidly heated to high temperatures. ◆ Heater Specifications ◆ ◎ Heating Element Used - NiCr (SH-IN type), W/BN Composite (SH-BN type) ◎ Maximum Operating Temperature - 850℃ (SH-IN type), 1100℃ (SH-BN type) ◎ Compatible Substrate Sizes - 1 to 6 inches (*1, 1.6 inches is only available in Inconel type) ◎ Operating Atmosphere - SH-IN: Vacuum (1x10-7 Torr), Inert Gas, Atmosphere, O2, NH3, SiH4, CH4, etc. - SH-BN: Vacuum (1x10-7 Torr), Inert Gas, H2, He, CH4, C (*O2 not allowed) ◎ Sample clips for substrate fixation included ◆ Optional Specifications ◆ ◎ Vacuum Flanges (JIS, ICF, ISO) ◎ Substrate Rotation, Up and Down Lifting Mechanism ◎ Heater Controller Model: BWS-PS/HC-Mini
Price information
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Delivery Time
Model number/Brand name
SH-IN series, SH-BN series
Applications/Examples of results
Ideal for research and development applications such as thin film experiments, physical property studies, and material analysis in the field of semiconductor and electronic component substrate basic technology development, including CVD, PVD (PLD, ALD, evaporation, sputtering), and can also be utilized in production equipment.
Detailed information
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SH-IN-2.2inch-Sample Fixing Clip
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SH-IN-1.6inch custom heater Inconel 1.6inch heater right angled CF114 flange
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SH-BN-1.6inch heater with bracket SH-BN-1.6inch heater with bracket
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SH-IN-2.2inch - Example of installation with 4 rear supports
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SH-IN-2.2inch customer heater CF203 flange, Heater quarter faced
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SH-IN-1.6inch-600℃ Heating Up
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SH-IN-2.2inch-R【Circuit Board Rotation Mechanism】 SH-IN-2.2inch-rotation stage CF114 base flange
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【Target Carousel】 Substrate Heater Option 【Automatic Target Rotation Mechanism for PLD (Pulsed Laser Deposition) System】 - Target Size: 1 inch or 2 inch - Number of Targets: Up to 3 - Connection Flange: 8 inch (ICF203) - Self-Rotation: Target Selection (Revolution), Target Rotation (Rotation) - 19 inch Rack-Mount Dedicated Controller
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Line up（12）
| Model number | overview |
|---|---|
| SH-IN-1.0inch | Heating section Φ1.0inch Max 850℃ Inconel plate Operating atmosphere: Vacuum (1x10-7Torr〜760Torr), Ar, N2, H2, CH4, He, O2 |
| SH-IN-1.6inch | Heating section Φ1.6inch Max 850℃ Inconel plate Operating atmosphere: Vacuum (1x10-7Torr〜760Torr), Ar, N2, H2, CH4, He, O2 |
| SH-IN-2.2inch | Heating section Φ2.2inch Max 850℃ Inconel plate Operating atmosphere: Vacuum (1x10-7Torr〜760Torr), Ar, N2, H2, CH4, He, O2 |
| SH-IN-3.1inch | Heating section Φ3.1inch Max 850℃ Inconel plate Operating atmosphere: Vacuum (1x10-7Torr〜760Torr), Ar, N2, H2, CH4, He, O2 |
| SH-IN-4.1inch | Heating section Φ4.1inch Max 850℃ Inconel plate Operating atmosphere: Vacuum (1x10-7Torr〜760Torr), Ar, N2, H2, CH4, He, O2 |
| SH-IN-6.1inch | Heating section Φ6.1inch Max 850℃ Inconel plate Operating atmosphere: Vacuum (1x10-7Torr〜760Torr), Ar, N2, H2, CH4, He, O2 |
| SH-BN-1.0inch | Heating section Φ1.0inch Max 850℃ BN plate (with Mo cover) Operating atmosphere: Vacuum (1x10-7Torr〜760Torr), Ar, N2, H2, CH4, He |
| SH-BN-1.6inch | Heating section Φ1.6inch Max 850℃ BN plate (with Mo cover) Operating atmosphere: Vacuum (1x10-7Torr〜760Torr), Ar, N2, H2, CH4, He |
| SH-BN-2.2inch | Heating section Φ2.2inch Max 850℃ BN plate (with Mo cover) Operating atmosphere: Vacuum (1x10-7Torr〜760Torr), Ar, N2, H2, CH4, He |
| SH-BN-3.1inch | Heating section Φ3.1inch Max 850℃ BN plate (with Mo cover) Operating atmosphere: Vacuum (1x10-7Torr〜760Torr), Ar, N2, H2, CH4, He |
| SH-BN-4.1inch | Heating section Φ4.1inch Max 850℃ BN plate (with Mo cover) Operating atmosphere: Vacuum (1x10-7Torr〜760Torr), Ar, N2, H2, CH4, He |
| SH-BN-6.1inch | Heating section Φ6.1inch Max 850℃ BN plate (with Mo cover) Operating atmosphere: Vacuum (1x10-7Torr〜760Torr), Ar, N2, H2, CH4, He |
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News about this product（60）
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【Endless possibility_thermal engineering...】 Our company sells vacuum thin film devices for semiconductor and electronic device fundamental research, ultra-high temperature heaters for CVD substrate heating, experimental furnaces, temperature measurement equipment, and more. To meet the endless demand for "heat," which is indispensable in any era, and to respond to various requests in the field of fundamental technology development, we aim to introduce the latest equipment and contribute to research and development in Japan.