【nanoPVD-S10A】Magnetron Sputtering Device
High-performance, cost-effective RF/DC magnetron sputtering system for research and development.
High-Performance RF/DC Magnetron Sputtering Equipment ● Achievable pressure: 5 x 10^-5 Pa (*1 x 10^-4 Pascal in the fastest 30 minutes!) ● 3 x Manetron cathodes: Sequential multi-layer film, 2 sources' co-deposition ● Film uniformity ±3% ● Various options: Substrate rotation and Z-shift, substrate heating (Max 500℃), cathodes for magnetic targets, and more ◉ nanoPVD can be used for various purposes, including up to 3 sputter sources + 3 gas flow control (MFC control), RF/DC PSU upgrade (up to 2 power supplies), sequential multi-layer film, and 2 sources' co-deposition (RF/DC or DC/DC only). - Insulating films - Conductive metal films - Compounds, etc. 【Main Features】 ◉ Substrate size: Up to Φ4 inch ◉ 2" cathodes x up to 3 sources ◉ 7" touch panel for easy operation with PLC automatic process control ◉ APC automatic pressure control ◉ High-precision process control with capacitance manometer ◉ 1 Ar gas system (standard) + N2, O2 expandable up to 3 systems ◉ USB port for connection to Windows PC, allowing the creation and storage of recipes for up to 1000 layers and 50 films. Data logging on PC ◉ Other various options available
basic information
◉ All operations and recipe management are centrally controlled via a 7" touch panel. ◉ User-registered film recipes and process controls (vacuum draw/venting, film deposition rate, APC automatic pressure control, cathode switching, shutter opening and closing, heating/lifting and rotating adjustments, etc.) can be fully automated (manual operation is also possible). The accompanying software for Windows PC (IntelliLink) allows for equipment monitoring and data logging. 【Main Specifications】 - RF/DC magnetron system - 2-inch magnetron cathodes x up to 3 - RF power: 150W automatic matching - DC power: 780W - Substrate size: up to 4 inches - Substrate rotation, z-shift stage, heating (500℃) - Process gas control: MFC x 1 (Ar standard, up to 3 additional systems: N2, O2) - APC automatic control (capacitance manometer *optional) - Quartz oscillator film thickness monitor - Shutters - Dimensions: 804(W) x 570(D) x 600(H) mm - Weight: approximately 70 kg - Power supply: 200VAC 50/60Hz 15A - Chamber size: Φ225 (inner diameter) x 250 mm - Vacuum system: TMP + RP (dry pump optional)
Price range
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Model number/Brand name
nanoPVD-S10A
Applications/Examples of results
Various electronic device thin film experiments Supports metal films, insulating films, compound films, and many other applications.
Detailed information
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nanoPVD system front Chamber: Φ259(H) x Φ225(i.d)mm Front viewport 7-inch touch screen
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nanoPVD system back Turbo molecular pump + rotary pump Windows PC USB connection for data logging with dedicated software
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Front view port
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2-inch Magnetron Cathode (compatible with DC/RF/Pulse DC) x up to 3 sources
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Line up（2）
| Model number | overview |
|---|---|
| nanoPVD-S10A | |
| nanoPVD-S10A-WA | Equipped with a stage compatible with Φ6inch and Φ8inch substrates |
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【Endless possibility_thermal engineering...】 Our company sells vacuum thin film devices for semiconductor and electronic device fundamental research, ultra-high temperature heaters for CVD substrate heating, experimental furnaces, temperature measurement equipment, and more. To meet the endless demand for "heat," which is indispensable in any era, and to respond to various requests in the field of fundamental technology development, we aim to introduce the latest equipment and contribute to research and development in Japan.