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[Analysis Case] Evaluation of Composition Distribution of Ultra-Thin Films Using Angle-Resolved XPS (ARXPS)

It is possible to evaluate the depth profile of ultra-thin films on the substrate.

Angle-resolved X-ray photoelectron spectroscopy (ARXPS) is a technique that detects photoelectrons emitted by X-ray irradiation at different take-off angles, using spectra with varying detection depths to evaluate the depth profile near the sample surface. Compared to traditional methods using Ar ion sputtering, it offers improved depth resolution and advantages such as the absence of compositional changes due to selective sputtering or mixing, making it effective for evaluating the depth profiles of ultra-thin films (on the order of a few nanometers) on substrates. This document presents a case study on the evaluation of compositional distribution within a SiN film on a Si substrate.

Related Link - https://www.mst.or.jp/casestudy/tabid/1318/pdid/48…

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For detailed data, please refer to the catalog.

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Applications/Examples of results

Analysis of LSI and memory.

[Analysis Case] Evaluation of Composition Distribution of Ultra-Thin Films by Angle-Resolved XPS (ARXPS) _C0550

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