Atomic Force Microscopy (AFM) method

Three-dimensional measurement of nanoscale surface roughness.

AFM is a method that scans the surface of a sample with a fine probe and measures nanoscale surface topography in three dimensions. - It can measure a wide range of samples, from insulators to soft organic materials, including metals, semiconductors, and oxides. - By using tapping mode with low contact pressure, it is possible to minimize sample damage.

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■ Probe Used A sharp probe made by processing silicon single crystal wafers is used to scan the sample surface. The tip diameter has been processed to less than 10 nm. ■ Tapping Mode In tapping mode, the probe is forced to oscillate at a high frequency of about 300 kHz while scanning the sample surface. During the scanning process, as the probe approaches the sample surface, the oscillation amplitude of the probe decreases, and conversely, it increases as the probe moves away. This method controls the height of the probe to maintain a constant oscillation amplitude by compensating for this change. The position of the probe is determined by illuminating it with a laser and detecting the reflected light with a photodetector.

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Applications/Examples of results

- Surface roughness evaluation of substrates (Si, compound semiconductors, glass, metals, organic materials, etc.) - Surface roughness evaluation of thin films (polysilicon, oxides, metals, organic materials, etc.) - Shape evaluation of MEMS