All products and services
1～30 item / All 55 items
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◆OLED◆ Organic vapor deposition - high-temperature metal deposition cell Max 1500℃
It is a high-performance vacuum deposition source that can be used as a high-temperature heating cell for vacuum applications, with an organic deposition source up to 800°C and a metal deposition source up to 1500°C.
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Wafer Scale Graphene Synthesis Device [nanoCVD-WGP]
Plasma CVD equipment compatible with wafer sizes of Φ3 inch and Φ4 inch. Rapid synthesis of clean, high-quality graphene while suppressing impurities.
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Sputtering/Dual Chamber System [MiniLab]
Two thin film experimental devices are connected with a load lock mechanism. Different film deposition devices (sputtering, evaporation, etc.) are seamlessly connected with the load lock.
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【MiniLab】 Evaporation/Sputtering Dual Chamber System
Two thin-film experimental devices are connected with a load-lock mechanism. Different film deposition devices (sputtering, evaporation, etc.) are seamlessly connected with the load-lock.
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Multi-functional Sputtering Device 【MiniLab-S060】
A compact multi-thin film device that incorporates sputtering, deposition, electron beam (EB), and annealing thin film modules in a 60-liter volume chamber, suitable for various applications.
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Sputtering Equipment Multifunctional Sputter Device MiniLab-S060A
Compact multi-film device that incorporates sputtering, deposition, EB, and annealing thin film modules in a 60L volume chamber, suitable for various applications.
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MiniLab-SA125A Multi-Target Sputtering System
High-performance multi-sputtering device 6-element multi-sputter (for Φ4 inch) 4-element multi-sputter (for Φ6, 8 inch)
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Multivariate Multi-Sputtering Device [MiniLab-S125A]
High-performance multi-sputtering device 6-element multi-sputter (for Φ4 inch) 4-element multi-sputter (for Φ6, 8 inch)
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Sputtering device 'nanoPVD-S10A'
High-performance, cost-effective RF/DC magnetron sputtering device for research and development.
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Sputtering device "MiniLab series"
Due to its modular embedded design, it is possible to flexibly assemble dedicated equipment according to the required film deposition method. A compact thin-film experimental device that can accommodate various research applications.
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Sputtering device 'MiniLab-026'
Compact and space-saving! Ideal for research and development. Flexible configuration for purposes such as deposition, sputtering, and annealing.
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Sputtering device "MiniLab-060"
A semi-custom-made thin film experimental device that can be assembled with the desired configuration for processes such as sputtering, EB (electron beam), and annealing.
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【nanoPVD-S10A】Magnetron Sputtering Device
High-performance, cost-effective RF/DC magnetron sputtering system for research and development.
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◆nanoPVD-T15A◆ High-performance Organic and Metal Film Deposition Equipment
We have incorporated all the latest vacuum deposition technology into a compact benchtop-sized device that can effectively utilize limited lab space.
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Vacuum Deposition Device "MiniLab-026"
Compact and space-saving! Ideal for research and development, flexible configuration for purposes such as deposition, sputtering, and annealing.
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Vacuum Deposition Device "nanoPVD-T15A"
We have incorporated all the latest vacuum deposition technology into a compact benchtop-sized device that can effectively utilize limited lab space.
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Vacuum Deposition Device "MiniLab Series"
Due to its modular embedded design, it is possible to flexibly assemble dedicated machines according to the required film formation methods. A compact thin-film experimental device that can accommodate various research applications.
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Vacuum deposition device 'MiniLab-090' (for glove box)
Storage-compatible glove box PVD flexible thin film experimental device, featuring a tall chamber with a height of 570mm, contributes to improved uniformity during deposition.
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Vacuum Deposition Device "MiniLab-080"
Flexible configuration available upon request for methods such as deposition, sputtering, and EB. Adopts a tall chamber with a height of 570mm, contributing to improved uniformity during deposition.
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Annealing furnace "ANNEAL wafer annealing device"
Max 1000℃, MFC maximum 3 systems, APC pressure control, compatible with 4" or 6" substrates, high vacuum annealing equipment (<5 × 10^-7 mbar)
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Annealing furnace "MiniLab-WCF Ultra-High Temperature Wafer Annealing Furnace"
6 to 8 inch ultra-high temperature wafer annealing equipment, a high-performance machine that widely supports various purposes from research and development to small-scale production.
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Annealing furnace "Mini-BENCH-prism ultra-high temperature experimental furnace"
Maximum operating temperature 2000℃ Semi-automatic control Ultra-high temperature experimental furnace (carbon furnace, tungsten metal furnace) Compact and space-saving experimental furnace
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nanoCVD-8G Graphene Synthesis Device
◉ Short time: Easily conduct graphene synthesis experiments in just 30 minutes per batch. ◉ High-precision temperature and pressure control. ◉ Sophisticated software.
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◆ANNEAL◆ Wafer Annealing Equipment
Max 1000℃, maximum 3 systems for MFC, APC pressure control, compatible with 4" or 6" substrates, high vacuum annealing equipment (<5 × 10^-7 mbar)
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[Nanofurnace] BWS-NANO Thermal CVD Device
Hot Wall Type Thermal CVD Equipment: A compact, high-performance CVD device ideal for fundamental research.
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Vacuum Furnace "Mini-BENCH-prism Ultra-High Temperature Experimental Furnace"
Maximum operating temperature 2000℃ Semi-automatic control Ultra-high temperature experimental furnace (carbon furnace, tungsten metal furnace) Compact and space-saving experimental furnace
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Vacuum Furnace "Mini-BENCH Ultra-High Temperature Tabletop Experimental Furnace"
Tabletop small-sized experimental furnace - space-saving with a maximum operating temperature of 2000℃! We also manufacture metal furnaces for reducing atmospheres.
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Thin Film Experimental Device - "PRODUCTS GUIDE 2022"
Introduction of various experimental devices for research and development in semiconductors, electronic devices, fuel cells, displays, and thin film experiments.
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Products Guide: "Ultra-High Temperature Experimental Furnace Product Guide"
Introducing the Thermocera Japan research and development experimental furnace. It can be utilized for material development such as fuel cells and ceramics, as well as ultra-high temperature experiments involving graphite and more.
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【Mini-BENCH】Ultra High Temperature Tabletop Experimental Furnace Max 2000℃
Tabletop small-sized experimental furnace - space-saving, with a maximum operating temperature of 2000°C! We also manufacture metal furnaces for reducing atmospheres.
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