MiniLab-SA125A Multi-Target Sputtering System
High-performance multi-sputtering device 6-element multi-sputter (for Φ4 inch) 4-element multi-sputter (for Φ6, 8 inch)
Continuous multilayer film, simultaneous film formation (2-6 element simultaneous film formation: RF, DC can be freely switched from HMI) High-power RF, DC power supplies, and pulse DC power supplies can be flexibly configured with multi-cathodes using our unique 'Plasma Switching Relay' module, allowing for versatile applications. High-temperature substrate heating stage (double jacket water-cooled) options: -1) Max 600℃ (lamp heating) -2) Max 1000℃ (C/C composite) -3) Max 1000℃ (SIC coating) Reverse sputtering stage in load lock: -1) 300W, or -2) Soft-Etching (<30W) System main control: 'IntelliDep' control system Windows PC (or TP HMI) interface All operations are centrally managed from a single HMI screen.
basic information
【Main Specifications】 - Board Size: Supports Max 12 inch - Chamber: SUS304 UHV compatible, 500 x 500 x 500 mm - Achievable Vacuum Level: 5 x 10^-5 Pascal - Sputter Cathode: Φ2" (max 6), Φ3" (max 4) - Plasma Power Supply: RF 150W, 300W, DC 850W, HiPIMS 5KW - MFC x 3 systems (Ar, O2, N2) for reactive sputtering - Turbo Molecular Pump + Dry Scroll Pump - Main Chamber RIE Etching Stage RF 300W - LL Chamber <30W Low Power Control *Soft Etching *Unique "Soft-Etching" technology reduces substrate damage through substrate bias - Touch Panel or Windows PC Control: Operations are not dispersed; all operations can be performed via touch panel/PC. - Equipment Installation Dimensions: 1,767(W) x 754(D) x 1,645(H) mm ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, etc. are also possible. ● Multi-chamber systems can also be manufactured.
Price information
Please contact us.
Delivery Time
Applications/Examples of results
Manufacturing factories for electronic devices, fuel cells, displays, universities and research institutions, pharmaceutical and chemical factories, food factories, and many others.
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◆HTE Heater◆ High Vacuum Crucible Heating Heater Max 1500℃
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★★Thermosera Japan_Thin Film Experimental Equipment_"PRODUCTS GUIDE 2022"★★
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