◆HTE Heater◆ High Vacuum Crucible Heating Heater Max 1500℃
High-temperature crucible heating heater for vacuum use. A versatile heater unit that can be used as an organic deposition source at 800°C and a metal deposition source at 1500°C.
The HTE heater is a super high-temperature vacuum heating heater unit with a maximum operating temperature of 1500°C. It can be used with materials that have high evaporation temperatures, making it suitable for various applications such as low-temperature organic deposition (up to 800°C) and high-temperature resistance heating deposition (up to 1500°C) for vacuum deposition film formation. If used as a deposition source for vacuum film formation, shutters and actuators can also be added. When used as a high-temperature heater above 800°C, it features an internal shield structure designed with insulation and thermal shielding in mind. The shutter adopts a flip type, allowing multiple deposition sources to be installed in the chamber without interfering with other components. The crucible can be easily removed by simply taking off the upper cap, making the filling and replenishing of materials hassle-free. The main body is available for 1cc crucibles (maximum filling capacity of 1.5cc) and 10cc crucibles (maximum filling capacity of 15cc), and it can be replaced by swapping the main body with the base without removing the fixed base from the chamber. Two types of thermocouples, K type and C type, can be specified. Crucibles made of alumina (standard), quartz, PBN, and carbon are available for selection.
basic information
【Main Specifications】 ■ Maximum Control Temperature: 800℃ or 1500℃ ■ Operating Environment: In vacuum or inert gas (*O2 up to 800℃) ■ Heater: Tungsten filament ■ Crucible Volume: 1cc (maximum fill amount 1.5cc) ■ Crucible Material: Alumina (standard) ■ Case Material: SUS304 or Molybdenum ■ Thermocouple: Type K or Type C 【Options】 ⚫ Crucible Material: PBN, Graphite, Quartz ⚫ Heater: NiCr wire, Kanthal wire ⚫ Crucible Volume: 10cc (maximum fill amount 15cc) ⚫ Shutter: Pneumatic or Motor-driven ⚫ Water Cooling Jacket ⚫ Controller (Heater and Shutter Control Box)
Price information
Please contact us.
Delivery Time
Model number/Brand name
HTE Heater Max 1500℃
Applications/Examples of results
High vacuum crucible heating heater, vacuum deposition organic material deposition source, high-temperature evaporation metal deposition source, etc.
catalog(37)
Download All Catalogs
News about this product(45)
-

★☆★☆【MiniLab-026】Small Thin Film Experimental Device for R&D Development★☆★☆
This is a flexible thin film experimental device for R&D that eliminates waste by integrating the necessary minimum modules and controllers into a 19" compact rack with a Plug & Play feel, achieving compact size, space-saving design, simple operation, and high cost performance. It supports magnetron sputtering (up to 3 sources) or resistance heating evaporation (metal sources up to 2, organic materials x4), and can also be equipped with a substrate heating stage, allowing for the production of annealing devices and RF etching. There is also a glove box storage type available (specifications to be discussed). We offer a wide range of optional components that can be flexibly customized. ◉ Φ2 inch magnetron cathode (up to 3 sources) ◉ Resistance heating evaporation source filament, crucible, boat type (up to 4 poles with automatic switching via controller) ◉ Organic evaporation cell: 1cc or 5cc ◉ Glove box compatible (optional, specifications to be discussed) ◉ Other options: simultaneous film deposition, HiPIMS, automatic film deposition controller, custom substrate holders, load lock, substrate rotation/heating/cooling, and many more options available. *Please first contact us with your required specifications, and we will configure the system to meet your needs.
-

★☆★☆【MiniLab-026】Flexible Thin Film Experimental Device for R&D★☆★☆
This is a flexible thin-film experimental device for R&D that achieves minimal waste, compact size, simple operation, and high cost performance by integrating the necessary minimum modules and controllers into a 19" compact rack with a Plug&Play feel. It supports magnetron sputtering (up to 3 sources) or resistance heating evaporation (metal sources up to 2, organic materials x4), and can be equipped with a substrate heating stage, allowing for the production of annealing devices and RF etching. A glove box storage type is also available (specifications to be discussed). We offer a wide range of optional components that can be flexibly customized. ◉ Φ2 inch magnetron cathode (up to 3 sources) ◉ Resistance heating evaporation source filament, crucible, boat type (up to 4 poles with automatic switching via controller) ◉ Organic evaporation cell: 1cc or 5cc ◉ Can be equipped with a glove box (optional, specifications to be discussed) ◉ Other options: Simultaneous film deposition, HiPIMS, automatic film deposition controller, custom substrate holders, load lock, substrate rotation/heating/cooling, and many other options available. *Please first contact us with your required specifications, and we will configure the system according to your needs.
-

Multi-functional Sputtering System 【MiniLab-S060】
4 cathodes with Φ2 inch mounted Simultaneous film formation: 3-component simultaneous film formation (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed from the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coat) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.
-

★【MiniLab-060】Flexible Thin Film Experimental Device★ Thermosera Japan
Compact/Space-saving, High-spec 60ℓ volume multi-thin film experimental device that can accommodate various applications by integrating thin film modules such as evaporation, sputtering, EB, and annealing. Compact/Space-saving, High-spec thin film experimental device. Combinations possible from the following evaporation sources: - Resistance heating evaporation source x up to 4 - Organic evaporation source x up to 4 - Electron beam evaporation - 2-inch magnetron sputtering cathode x 4 - Plasma etching: can be installed in either the main chamber or the load lock chamber 【Small Footprint/Space-saving】 - Dual rack type (MiniLab-060): 1200(W) x 590(D)mm 【Excellent Operability/Intuitive Operation Screen】 Windows PC or 7” touch panel. Easy operation regardless of skill level, with maximum safety considerations.
-

【MiniLab】 Evaporation/Sputtering Dual Chamber System
Two thin film experimental devices are connected by a load lock mechanism. Different film deposition devices (sputtering - evaporation, etc.) are seamlessly connected via the load lock. With Moorfield's unique load lock system, connections to the process chamber on the left, right, and rear are also possible (see photo below). 1. MiniLab-E080A (Evaporation Device) - EB evaporation: 7cc crucible x 6 - Resistance heating evaporation x 2 - Organic evaporation limit x 2 2. MiniLab-S060A (Sputtering Device) - Φ2" Magnetron cathode x 4 for simultaneous sputtering - Compatible with both DC and RF power supplies 3. Load Lock Chamber - Plasma etching stage In the load lock chamber, plasma cleaning of the substrate surface is performed using the "RF/DC substrate bias stage," and the company's unique "soft etching" technology allows for a <30W low-power, damage-free plasma etching stage. This enables delicate etching processes that are prone to damage, such as 2D (removal of resists like PMMA), graphene delamination, and etching of Teflon substrates. (*This can also be installed in the main chamber stage.)
Recommended products
Distributors
【Endless possibility_thermal engineering...】 Our company sells vacuum thin film devices for semiconductor and electronic device fundamental research, ultra-high temperature heaters for CVD substrate heating, experimental furnaces, temperature measurement equipment, and more. To meet the endless demand for "heat," which is indispensable in any era, and to respond to various requests in the field of fundamental technology development, we aim to introduce the latest equipment and contribute to research and development in Japan.





















































