Sputtering and deposition source hybrid thin film device [nanoPVD-ST15A]
Composite thin film experimental device nanoPVD-ST15A capable of mixed installation of vacuum deposition (metal and organic deposition sources) and sputtering cathodes.
The nanoPVD-ST15A is a composite thin film experimental device that can simultaneously install a resistance heating deposition source, an organic deposition source, and a Φ2 inch magnetron sputtering cathode. It is bench-top sized and space-saving, making effective use of limited lab space. It is not a coater for microscope sample preparation; it can create high-quality thin films required for research and development applications such as electronic circuit boards, batteries, MEMS, and new material development. It is equipped with a maximum of three gas systems (process pressure APC automatic control), continuous automatic film formation (up to 20 layers), and simultaneous deposition from two sources, along with a variety of other features. Additionally, it offers options such as a substrate heating heater (up to 500°C) and a dry scroll pump. Vacuum pumping, film formation control, venting, recipe creation, as well as failure analysis and logging can all be operated via a 7" touch panel on the front, allowing for centralized management of operations. The IntelliLink software is included: it connects to a Windows PC via USB cable for remote monitoring, offline recipe creation, downloading and uploading, and log saving. It supports various applications in the development of new materials and new material development, as well as in advanced fundamental technology development sectors such as semiconductors, electronic components, fuel cells, and solar cells.
basic information
◆Film Formation Source◆ - Φ2 inch Magnetron Sputter Cathode x 1 - Resistance Heating Evaporation Source (up to 2) - Organic Evaporation Source (up to 2) ◆Substrate Size◆ - Up to Φ4 inch/Φ100 mm Substrate Holder (custom holder available upon consultation) ◆Film Thickness Sensor◆ - Quartz Crystal Film Thickness Sensor x 1 ◆Vacuum Exhaust◆ - Turbo Molecular Pump, Rotary Pump ◆Included Software◆ - IntelliLink Windows PC Remote Monitoring Software ◆Options◆ - Substrate Heating Heater Max 500℃ - Dry Scroll Pump ◆Utilities◆ - Power Supply: AC200V Single Phase 50/60HZ 15A - Process Gas: 0.2Mpa - Vent Gas: 0.04Mpa - Compressed Air: 0.6Mpa - Cooling Water: 2L/min 0.2Mpa ◆Main Applications◆ - New Material Development - Fuel Cells - Others
Price information
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Delivery Time
Model number/Brand name
nanoPVD-ST15A
Applications/Examples of results
◆Main Application Areas◆ - Electronic components - Optical films - Anti-reflective films - Organic transistors, organic EL, and other basic research and product development in educational and research institutions.
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Hot Stage [Substrate Heating Mechanism] Ultra-High Temperature Substrate Heating Stage Max 1800℃ _ Φ2 to Φ6 inch
High-temperature substrate heating mechanism for vacuum thin film processes, used for the development of semiconductors, electronic devices, etc. It can be utilized for various film deposition experiments on silicon substrates, sapphire substrates, compound substrates, and others. Selection of elements and materials according to ultra-high temperature substrate heating conditions (Max 1800°C) for vacuum equipment such as CVD and sputtering is possible. ◉ Compatible with ultra-high vacuum, inert gas, O2, and various process gas atmospheres. ◉ Substrate up/down/rotation mechanism and RF/DC bias application possible. ◉ Selection of elements according to the atmosphere: NiCr, Inconel, Tungsten, Graphite, CC composite, Graphite (SiC coating, PBN coating) CC composite (PG coating) ◉ Various vacuum flange connections: ICF, VF ◉ Thermocouple included ◉ Other options: Motor controller, temperature control unit, transbox.
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